Method for polishing hard surfaces

ABSTRACT

The present invention relates to a method for polishing hard surfaces. The method includes applying a composition including an alkoxylate to a hard surface to be polished.

FIELD OF THE INVENTION

The present invention relates to a method for polishing a hard surface.The method includes applying a composition including a glycol and/oralkoxylate to a hard surface to be polished.

BACKGROUND OF THE INVENTION

Metal surfaces have long required polishing, in particular, in the foodservice and health care industry. Recently, more and more home kitchenappliances have begun to use stainless steel as a facing. Unfortunately,the stainless steel readily shows grease smudges, fingerprints, etc. andrequires polishing to restore its shine.

Current polishes include oil, such as mineral, vegetable, or silicon oilas the polishing agent. Such polishes have several disadvantages. Forinstance, any overspray of the polish onto the floor presents a sliphazard due to the oil polishing agent. Also, due to the low watersolubility of the oil, any clean up of the polish is difficult. Inaddition, mineral and silicon oils are undesirable on surfaces that maycome in contact with food, such as steel sinks in restaurants. Vegetableoils oxidize on a metal surface causing the metal surface to darken overtime.

There remains need for a method for polishing that does not employ anoil based polish.

SUMMARY OF THE INVENTION

The present invention relates to a method for polishing a hard surface.The method includes applying a composition including a glycol and/oralkoxylate to a hard surface to be polished.

In an embodiment, the method of polishing a hard surface includesapplying a composition including a glycol and/or alkoxylate and a sourceof alkalinity.

In an embodiment, the method of polishing a hard surface includesapplying a composition including an glycol and/or alkoxylate, a wettingagent, a source of alkalinity, and a sequestrant.

In another embodiment, the glycol is represented by Formula I:HO(R—CHCH₂O)_(n)H, where R is an alkyl group containing 1 to 3 carbonatoms and n is 1 to 10,000.

In another embodiment, the method of polishing a hard surface includesapplying a composition including an ethoxylate propoxylate.

In another embodiment, the method of polishing includes removing soil.

DETAILED DESCRIPTION OF THE INVENTION

Definitions

As used herein, weight percent (wt-%), percent by weight, % by weight,and the like are synonyms that refer to the concentration of a substanceas the weight of that substance divided by the weight of the compositionand multiplied by 100.

As used herein, the term “about” modifying the quantity of an ingredientin the compositions of the invention or employed in the methods of theinvention refers to variation in the numerical quantity that can occur,for example, through typical measuring and liquid handling proceduresused for making concentrates or diluting concentrates in the real world;through inadvertent error in these procedures; through differences inthe manufacture, source, or purity of the ingredients employed to makethe compositions or carry out the methods; and the like. Whether or notmodified by the term “about”, the claims include equivalents to thequantities.

As used herein “polishing” means imparting smoothness, gloss, surfaceprotection, or a decorative finish on a hard surface.

Method of Polishing

The present invention relates to a method of polishing a hard surface.The method includes applying a composition including a glycol and/or analkoxylate to a hard surface. Applying the composition to the hardsurface can include spraying (e.g., nonaerosol spraying), wiping,rubbing, foaming on, or any other form of contacting the compositionwith the hard surface to be polished. In an embodiment, applying caninclude spraying (e.g., nonaerosol spraying), wiping, foaming, orrubbing.

Suitable hard surfaces that can be polished according to the presentmethod include stainless steel, aluminum, copper, vinyl, plastic, metal,rubber, formica, wood, mild steel, melamine, brass, ceramic, and stone.In an embodiment, the object or surface polished by the present methodcan be opaque or translucent. In an embodiment, the object or surfacepolished by the present method can be opaque. Exemplary appliances orother devices requiring polishing include refrigerators, stoves,dishwashers, elevators, doors, faucets, countertops, sinks, and thelike.

The present invention can also include diluting a concentrate to formthe composition that is applied to the hard surface. Suitable diluentsinclude water, glycol ether, ethanol, propanol, and isopropanol. In anembodiment, the concentrate can be diluted with water. In certainembodiments, the composition contains about 10% by weight to about 90%by weight diluent, about 20% by weight to about 70% by weight diluent,about 90% by weight to about 99.5% by weight diluent, and about 30% byweight to about 60% by weight diluent. The diluent can be present at anyof these amounts not as part of a range and/or at any of these amountsnot modified by about.

The present invention can also include removing soil. Applying thecomposition to a hard surface can remove soil. The composition caninclude components that are suitable in removing soil from a hardsurface. Such soil can include oil, grease, dirt, contaminant, bacteria,food, body fluids, mixture thereof, or the like. In an embodiment, thesoil includes oil, grease, or dirt.

Polishing Composition

The composition employed in the present method includes a polishingagent. The composition can also include a cleaning agent or any of avariety of other components. The composition can be in the form ofliquid, gel, paste, solid, powder, or foam.

Polishing Agent

The polishing agent can include a glycol such as an alkylene glycol.Suitable alkylene glycols include those represented by formula I:HO(R—CHCH₂O)_(n)H  (I)In formula I, R can be, for example, an alkyl group containing 1 to 3carbon atoms. The alkyl group can be straight or branched chain. Incertain embodiments, n can be 1 to 10,000, 1 to 1,000, 1 to 100, or 1 to10. An exemplary polishing agent is propylene glycol and any of itsoligomers. Propylene glycol and dipropylene glycol are considered safeaccording to government (e.g. FDA or USDA, listed on FDA's GenerallyRecognized As Safe list) rules and regulations. Preferred polishingagents do not include glycol ether.

The polishing agent can include an alkoxylate. In an embodiment, thealkoxylate includes a C3-C6 alkoxy substituent. Exemplary alkoxylatesthat can be used according to the invention include surfactant includingnonionic block copolymers, alcohol alkoxylates, and alkoxylates havingadditional functionality including alkyl polyglycosides, zwitterionics,anionics, and mixtures thereof. Additional exemplary polishing agentsinclude alcohol propoxylates; alkylphenol ethoxylate-propoxylates;alkoxylated derivatives of carboxylic acids, amines, amides and esters;and ethylene oxide-propylene oxide copolymers. Exemplary ethyleneoxide-propylene oxide polymers include those available under the namesPluronic, Pluronic R, Tetronic, and Tetronic R from BASF.

Exemplary nonionic block copolymer surfactants includepolyoxyethylene-polyoxypropylene block copolymers. Exemplarypolyoxyethylene-polyoxypropylene block copolymers that can be used havethe formulae:(EO)_(x)(PO)_(y)(EO)_(x)(PO)_(y)(EO)_(x)(PO)_(y)(PO)_(y)(EO)_(x)(PO)_(y)(EO) _(x)(PO)_(y)wherein EO represents an ethylene oxide group, PO represents a propyleneoxide group, and x and y reflect the average molecular proportion ofeach alkylene oxide monomer in the overall block copolymer composition.Preferably, x is from about 10 to about 130, y is about to about 70, andx plus y is about 25 to about 200. It should be understood that each xand y in a molecule can be different. The total polyoxyethylenecomponent of the block copolymer is preferably at least about 20 mol-%of the block copolymer and more preferably at least about 30 mol-% ofthe block copolymer. The material preferably has a molecular weightgreater than about 1,500 and more preferably greater than about 2,000.Although the exemplary polyoxyethylene-polyoxypropylene block copolymerstructures provided above have 3 blocks and 5 blocks, it should beappreciated that the nonionic block copolymer surfactants according tothe invention can include more or less than 3 and 5 blocks. In addition,the nonionic block copolymer surfactants can include additionalrepeating units such as butylene oxide repeating units. Furthermore, thenonionic block copolymer surfactants that can be used according to theinvention can be characterized heteric polyoxyethylene-polyoxypropyleneblock copolymers. Exemplary sheeting agents that can be used accordingto the invention are available from BASF under the name Pluronic, and anexemplary EO-PO co-polymer that can be used according to the inventionis available under the name Pluronic N3.

The polishing agent can be present in the composition at about 0.025 toabout 90 wt-%, about 0.1 to about 10 wt-%, about 0.1 to about 70 wt-%,about 0.5 to about 2 wt-%, about 0.025 to about 4 wt-%, about 10 toabout 90 wt-%, about 25 to about 90 wt-%, about 30 to about 70 wt-%,about 40 to about 60 wt-%, about 20 to about 60 wt-%, or about 45 toabout 55 wt-%. The polishing agent can be present at any of theseamounts not as part of a range and/or at any of these amounts notmodified by about.

Additional Components

The composition may include additional components. Exemplary additionalcomponents include sequestrant, source of alkalinity, acid, wettingagent, organic solvents, and aesthetic modifiers such as dye orfragrance.

Sequestrant/Builder

The composition employed in the present method can include a sequestrantor builder. In general, a sequestrant is a molecule capable ofcoordinating (i.e., binding) the metal ions commonly found in naturalwater to prevent the metal ions from interfering with the action of theother ingredients of the composition. For a further discussion ofchelating agents/sequestrants, see Kirk-Othmer, Encyclopedia of ChemicalTechnology, Third Edition, volume 5, pages 339-366 and volume 23, pages319-320.

A variety of sequestrants or builders can be used in the composition,including, for example, organic phosphonate, aminocarboxylic acid,condensed phosphate, inorganic builder, polymeric polycarboxylate,mixtures thereof, or the like. Such sequestrants and builders arecommercially available.

Suitable condensed phosphates include sodium and potassiumorthophosphate, sodium and potassium pyrophosphate, sodium and potassiumtripolyphosphate, sodium hexametaphosphate, and the like, e.g., thesodium salt, e.g., of pyrophosphate. A condensed phosphate may alsoassist, to a limited extent, in solidification of the composition byfixing the free water present in the composition as water of hydration.

Polymeric polycarboxylates that can be used according the invention caninclude a polymer and/or an oligomer containing pendant carboxylic acidgroups and/or pendant carboxylic acid salt groups. It should beunderstood that the term “pendant” refers to the groups being presentother than in the polymer backbone and/or oligomer backbone. Thedispersants can be available as homopolymers or co-polymers or ashomo-oligomers or co-oligomers. Exemplary sequestrants include, forexample, poly(acrylic acid), poly(maleic acid/olefin) copolymer,poly(acrylic acid/maleic acid) copolymer, polymethacrylic acid, acrylicacid-methacrylic acid copolymers, hydrolyzed polyacrylamide, hydrolyzedpolymethacrylamide, hydrolyzed polyamide-methacrylamide copolymers,hydrolyzed polyacrylonitrile, hydrolyzed polymethacrylonitrile,hydrolyzed acrylonitrile-methacrylonitrile copolymers, polymaleic acid,polyfumaric acid, copolymers of acrylic and itaconic acid, phosphinopolycarboxylate, and the like. An exemplary sequestrant is maleicanhydride/olefin copolymer. An exemplary maleic anhydride/olefincopolymer is available from Rohm & Haas under the name Acusol 460N. Anexemplary polyacrylic acid sodium salt having a molecular weight ofabout 4,500 is available from Rohm & Haas under the name Acusol 434N. Anexemplary acrylic acid/maleic acid co-polymer having a molecular weightof about 3,200 is available from Rohm & Haas under the Acusol 448. Anexemplary acrylic acid/maleic acid sodium salt having a molecular weightof about 70,000 is available from Rohm & Haas under the name Acusol479N. An exemplary acrylic acid/maleic acid sodium salt having amolecular weight of about 40,000 is available from Rohm & Haas under thename Acusol 505N.

In an embodiment, the present composition includes as sequestrant orbuilder condensed phosphate and polyacrylate, or another polymer, forexample, sodium tripolyphosphate and polyacrylate. In an embodiment,sodium salts of condensed phosphates are preferred to the correspondingpotassium salts. In an embodiment, the present composition includes assequestrant or builder polycarboxylates, such as polyacrylate and/orphosphino polycarboxylate.

The builder can include an organic phosphonate, such as anorganic-phosphonic acid and alkali metal salts thereof. Some examples ofsuitable organic phosphonates include:

-   1-hydroxyethane-1,1-diphosphonic acid: CH₃C(OH)[PO(OH)₂]₂;-   aminotri(methylenephosphonic acid): N[CH₂PO(OH)₂]₃;-   aminotri(methylenephosphonate), sodium salt-   2-hydroxyethyliminobis(methylenephosphonic acid):    HOCH₂CH₂N[CH₂PO(OH)₂]₂;-   diethylenetriaminepenta(methylenephosphonic acid):-   (HO)₂POCH₂N[CH₂CH₂N[CH₂PO(OH)₂]₂]₂;-   2-phosphonobutane-1, 2, 4-tricarboxylic acid;-   diethylenetriaminepenta(methylenephosphonate), sodium salt:    C₉H_((28-x))N₃Na_(x)O₁₅P₅ (x=7);-   hexamethylenediamine(tetramethylenephosphonate), potassium salt:    C₁₀H_((28-x))N₂K_(x)O₁₂P₄ (x=6);-   bis(hexamethylene)triamine(pentamethylenephosphonic acid):-   n(HO₂)POCH₂N[(CH₂)₆N[CH₂PO(OH)₂]₂]₂; and-   phosphorus acid H₃PO₃; and other similar organic phosphonates, and    mixtures thereof.

Suitable organic phosphonates include PBTC, ATMP, and DTPMP.

The sequestrant can be or include aminocarboxylic acid type sequestrant.Suitable aminocarboxylic acid type sequestrants include the acids oralkali metal salts thereof, e.g., amino acetates and salts thereof. Someexamples include the following:

-   N-hydroxyethylaminodiacetic acid;-   hydroxyethylenediaminetetraacetic acid, nitrilotriacetic acid (NTA);-   ethylenediaminetetraacetic acid (EDTA);-   N-hydroxyethyl-ethylenediaminetriacetic acid (HEDTA);-   diethylenetriaminepentaacetic acid (DTPA); and-   alanine-N,N-diacetic acid;-   and the like; and mixtures thereof.

Suitable aminocarboxylates include ethylenediamine tetraacetic acid(EDTA), diethylenetriamine pentaacetic acid (DTPA), their alkali metalsalts, and mixtures thereof.

The sequestrant/builder can be present in a use dilution of thecomposition at about 0 to about 1 wt-%, about 0.01 to about 0.5 wt-%,about 0.01 to about 0.04 wt-%, about 0.005 to about 0.08 wt-%, about0.0025 to about 0.1 wt-%, or about 0.005 to about 0.2 wt-%. Thepolishing agent can be present at any of these amounts not as part of arange and/or at any of these amounts not modified by about.

Source of Alkalinity

The composition employed in the present method can include one or morealkalinity sources, which can enhance polishing of a hard surface andimprove soil removal performance of the composition. The source ofalkalinity can include an alkali metal salt, such as alkali metalcarbonate, alkali metal hydroxide, alkali metal silicate (e.g.,metasilicate), or the like; metal borate, such as sodium or potassiumborate, and the like; alkanolamines and amines; inorganic alkalinitysource, such as alkali metal hydroxide or silicate (e.g., metasilicate),or the like; and other like alkaline sources. The choice and thequantity of alkalinity source can be sufficient to render thecomposition alkaline. An exemplary source of alkalinity ismonoethanolamine.

Suitable alkali metal hydroxides include, for example, sodium orpotassium hydroxide, e.g., sodium hydroxide. An alkali metal hydroxidemay be added to the composition in a variety of forms, including forexample in the form of solid beads, dissolved in an aqueous solution, ora combination thereof. Alkali metal hydroxides are commerciallyavailable as a solid in the form of prilled solids or beads having a mixof particle sizes ranging from about 12-100 U.S. mesh, or as an aqueoussolution, as for example, as a 50 wt-% and a 73 wt-% solution.

Examples of useful alkaline metal silicates include sodium or potassiumsilicate (with a M₂O:SiO₂ ratio of 1:2.4 to 5:1, M representing analkali metal) or metasilicate. In an embodiment, the alkaline metalsilicate includes sodium metasilicate.

In certain embodiments, the alkaline source includes a salt ofmetasilicate, of silicate, or of carbonate, e.g., a sodium salt.

The source of alkalinity can be present in a use dilution of thecomposition at about 0 to about 1 wt-%, about 0.01 to about 0.5 wt-%,about 0.045 to about 0.18 wt-%, about 0.02 to about 0.36 wt-%, about0.01 to about 0.72 wt-%, or about 0.05 to about 0.15 wt-%. The source ofalkalinity can be present at any of these amounts not as part of a rangeand/or at any of these amounts not modified by about.

Acids or Acidulants

The composition employed in the present method can include one or moreingredients to decrease the pH, e.g. one or more acids or acidulants.Suitable acids include organic and inorganic acids. For example,suitable inorganic acids include phosphoric acid, hydrochloric acid,nitric acid, sulfuric acid, sulfamic acid, mixtures thereof, or thelike. For example, suitable organic acids include lactic acid, citricacid, propionic acid, acetic acid, hydroxyacetic acid, formic acid,glutaric acid, malic acid, hydroxy propionic acid, succinic acid,glutaric acid, adipic acid, fumaric acid, mixtures thereof, or the like.The organic acid can be a mixture of adipic, malic, and succinic acidssold under the tradename Sokalan. In an embodiment, the acid includesphosphoric acid, lactic acid, or a mixture thereof. In an embodiment,the acid includes phosphoric acid, lactic acid, hydroxyacetic acid, or amixture thereof. In an embodiment, the acid includes citric acid, lacticacid, urea hydrochloride, or a mixture thereof.

The acidulant or acid can be present in the composition at about 0 toabout 1 wt-%, about 0.1 to about 0.5 wt-%, about 0.045 to about 0.18wt-%, about 0.02 to about 0.36 wt-%, about 0.01 to about 0.72 wt-%, orabout 0.05 to about 0.15 wt-%. The acidulant or acid can be present atany of these amounts not as part of a range and/or at any of theseamounts not modified by about.

Wetting or Defoaming Agent

Also useful in the composition of the invention are wetting anddefoaming agents. Wetting agents function to increase the surfacecontact or penetration activity of the composition employed in themethod of the invention. Wetting agents, which can be used in thecomposition of the invention, include any of those constituents knownwithin the art to raise the surface activity of the composition of theinvention.

Along these lines, surfactants, and especially nonionic surfactants, canalso be useful in the present invention. Nonionic surfactants, which canbe useful in the present invention, are those which include ethyleneoxide moieties, propylene oxide moieties, as well a mixtures thereof,and ethylene oxide-propylene oxide moieties in either heteric or blockformation. Additionally useful in the present invention are nonionicsurfactants which include an alkyl ethylene oxide compounds, alkylpropylene oxide compounds, as well as mixtures thereof, and alkylethylene oxide-propylene oxide compounds where the ethylene oxidepropylene oxide moiety is either in heteric or block formation. Furtheruseful in the present invention are nonionic surfactants having anymixture or combination of ethylene oxide-propylene oxide moieties linkedto a alkyl chain where the ethylene oxide and propylene oxide moietiescan be in any randomized or ordered pattern and of any specific length.Nonionic surfactants useful in the present invention can also includerandomized sections of block and heteric ethylene oxide propylene oxide,or ethylene oxide-propylene oxide, such as ethylene diamine ethyleneoxides, ethylene diamine propylene oxides, mixtures thereof, andethylene diamine EO-PO compounds, including those sold under thetradename Tetronic. An exemplary wetting agent is sodium lauryl sulfate.

The composition used in the methods of the invention can also containadditional ingredients as necessary to assist in defoaming.

Generally, defoamers which can be used in accordance with the inventioninclude silica and silicones; aliphatic acids or esters; alcohols;sulfates or sulfonates; amines or amides; halogenated compounds, such asfluorochlorohydrocarbons; vegetable oils, waxes, mineral oils as well astheir sulfated derivatives; fatty acid soaps such as alkali, alkalineearth metal soaps; and phosphates and phosphate esters such as alkyl andalkaline diphosphates, and tributyl phosphates among others; andmixtures thereof.

The wetting agent or defoaming agent can be present in the compositionat about 0 to about 1 wt-%, about 0.1 to about 0.5 wt-%, about 0.035 toabout 0.14 wt-%, about 0.02 to about 0.21 wt-%, about 0.015 to about0.28 wt-%, about 0.01 to about 0.49 wt-%, or about 0.05 to about 0.10wt-%. The wetting agent or defoaming agent can be present at any ofthese amounts not as part of a range and/or at any of these amounts notmodified by about.

Dyes/Odorants

Various dyes, odorants including perfumes, and other aesthetic enhancingagents may also be included in the composition. Dyes may be included toalter the appearance of the composition, as for example, Direct Blue 86(Miles), Fastusol Blue (Mobay Chemical Corp.), Acid Orange 7 (AmericanCyanamid), Basic Violet 10 (Sandoz), Acid Yellow 23 (GAF), Acid Yellow17 (Sigma Chemical), Sap Green (Keyston Analine and Chemical), MetanilYellow (Keystone Analine and Chemical), Acid Blue 9 (Hilton Davis),Sandolan Blue/Acid Blue 182 (Sandoz), Hisol Fast Red (Capitol Color andChemical), Fluorescein (Capitol Color and Chemical), Acid Green 25(Ciba-Geigy), Pylaklor Pink LX-10613, and the like.

Fragrances or perfumes that may be included in the compositions include,for example, terpenoids such as citronellol, aldehydes such as amylcinnamaldehyde, a jasmine such as C1S-jasmine or jasmal, vanillin, andthe like.

Polishing

The hard surface to be polished can include any surface that requirespolishing. Such hard surfaces include tires, bumpers on vehicles,plastic, tire rims, elevators, countertops, formica, sinks, faucets, andkitchen appliances.

Exemplary industries that may use the present invention are the foodindustry, the transportation industry (e.g. cars, trucks, boats,aircraft), the restaurant industry, the hospitality industry (e.g.,hotels, motels), consumer industry, healthcare industry (e.g. hospitals,nursing homes, dental and medical offices), and schools.

Depending upon the formulation, the composition of the invention can bea liquid, semi-liquid, gel, dispersion, paste, foam, powder, or solid,and can be in the form of a concentrate or ready-to-use formulation. Thecomposition generally has a capability of being used on a wide range ofsurfaces.

The present invention includes a broad variety of polishingapplications. Some examples include manual or machine polishing and thelike. The methods may be used manually, with hand operated polishingequipment or in automatic polishing equipment.

Exemplary application techniques include low pressure application, handpressure application, water jet spray apparatus or other manual ormechanical application methods and systems can be used, depending uponthe form of the composition. Some embodiments of the invention includeapplying composition, allowing to dry, and then removing or buffing off.Other embodiments are applied and worked into the surface immediately.

The composition can be applied to the hard surface by pouring thecomposition onto the hard surface directly or onto a cloth or rag, whichis then used to wipe the hard surface. The composition can be sprayedonto the surface as a liquid, foam, or aerosolized liquid. Thecomposition is then spread over the entire hard surface by wiping thehard surface with a cloth or rag, spreading the composition over theentire hard surface. The cloth or rag can include the composition orspread the composition that has been poured directly onto the hardsurface. Exemplary wiping motions can be circular, zigzag, or back andforth. The excess polish can be removed by wiping a new rag or cloth orthe existing rag or cloth over the excess polish.

The composition can also be contained within a liquid tight container.The container can include directions. The directions can includedirections on how to apply the composition or use the composition as apolish. The container can also include a wet wipe that is impregnated orsaturated with the composition. The container can also include a labelidentifying the container, such as a polish holding container.

The method of polishing can include rinsing. Typically rinsing meansremoving any excess composition from the hard surface to be polished.Exemplary rinsing steps include the use of a liquid, such as water. Thewater is contacted with the hard surface to remove any excesscomposition.

The present invention may be better understood with reference to thefollowing examples. These examples are intended to be representative ofspecific embodiments of the invention, and are not intended as limitingthe scope of the invention.

EXAMPLES Example 1

Various solutions of propylene glycol in water were prepared and testedas a polish on a stainless steel door of a dishwasher. The concentrationhad an impact on performance in terms of overall gloss and whether ornot streaking occurs. For instance, the 30% by weight propylene glycolhad slight streaking and good gloss behavior. Good gloss behavior meansan individual can discern 15 point letters in a reflection that is 6inches from the hard surface, but the reflection is not crisp or welldefined. The 50% by weight propylene glycol had no streaking andexcellent gloss behavior. Excellent gloss behavior means an individualcan discern 15 point letters in a reflection that is 6 inches from thehard surface, and the reflection has crisp edges and is well defined.TABLE 1 Results of Propylene Glycol as a polish % Propylene GlycolStreaking Gloss* 1 severe poor 20 moderate poor 30 slight good 50 noneexcellent*poor gloss = cannot discern individual letters of a 15 point print wordin reflection from 6″good gloss = can discern individual 15 point letters but not crisp andwell definedexcellent gloss = each 15 point letter has crisp edges and is welldefined

Example 2

The following composition is an exemplary composition that may be usedaccording to the present invention.

Example 2

Weight % Material 58.655 Deionized water 40.000 Propylene glycol 0.050Acusol 460 N, 25% 0.900 N-propoxypropanol 0.095 Monoethanolamine, 99%0.005 Pluronic N3 0.245 Sodium Lauryl Sulfate, 30% 0.050 TetrasodiumEDTA, 40%

Example 3

The following composition is an exemplary composition that may be usedaccording to the present invention.

Example 3

Weight % Material 1 Pluronic N3 99 Deionized water

Example 4

The following composition is an exemplary composition that may be usedaccording to the present invention.

Example 4

Weight % Material 50 Propylene glycol 50 Deionized water

Example 5

The following composition is an exemplary composition that may be usedaccording to the present invention.

Example 5

Weight % Material 1 Propylene glycol (2000 molecular weight) 99Deionized water

It should be noted that, as used in this specification and the appendedclaims, the singular forms “a,” “an,” and “the” include plural referentsunless the content clearly dictates otherwise. Thus, for example,reference to a composition containing “a compound” includes a mixture oftwo or more compounds. It should also be noted that the term “or” isgenerally employed in its sense including “and/or” unless the contentclearly dictates otherwise.

All publications and patent applications in this specification areindicative of the level of ordinary skill in the art to which thisinvention pertains.

The invention has been described with reference to various specific andpreferred embodiments and techniques. However, it should be understoodthat many variations and modifications may be made while remainingwithin the spirit and scope of the invention.

1. A method of polishing a hard surface, comprising applying acomposition to the hard surface, the composition comprising: at leastone glycol.
 2. The method according to claim 1, wherein the glycol isrepresented by Formula I:HO(R—CHCH₂O)_(n)H where R is an alkyl group containing 1 to 3 carbonatoms and n is 1 to 10,000.
 3. The method according to claim 2, whereinn is 1 to 1,000.
 4. The method according to claim 2, wherein n is 1 to100.
 5. The method according to claim 2, wherein n is 1 to
 10. 6. Themethod according to claim 1, wherein the glycol is at least one ofpropylene glycol, dipropylene glycol, and polypropylene glycol.
 7. Themethod according to claim 1, wherein the composition further comprises awetting agent.
 8. The method according to claim 1, further comprisingdiluting a concentrate to form the composition.
 9. The method accordingto claim 1, wherein the composition comprises about 30 to about 70 wt-%glycol.
 10. The method according to claim 1, wherein the compositioncomprises about 0.1 to about 70 wt-% glycol.
 11. The method according toclaim 1, wherein the composition comprises about 45 to about 55 wt-%glycol.
 12. The method according to claim 11, wherein the glycol isrepresented by Formula I:HO(R—CHCH₂O)_(n)H where R is an alkyl group containing 1 to 3 carbonatoms and n is 1 to 10,000.
 13. The method according to claim 12,wherein the glycol is at least one of propylene glycol, dipropyleneglycol, and polypropylene glycol.
 14. The method according to claim 8,further comprising removing soil from the hard surface.
 15. The methodaccording to claim 14, further comprising rinsing the hard surface. 16.The method according to claim 1, wherein the hard surface is metal. 17.The method according to claim 1, wherein the hard surface is a tire. 18.A method of polishing a hard surface, comprising applying a compositionto the hard surface, the composition comprising about 45 wt-% to about55 wt-% propylene glycol.
 19. The method according to claim 18, furthercomprising removing soil from the hard surface.
 20. A method ofpolishing a hard surface, comprising applying a composition to the hardsurface, the composition comprising an ethoxylate propoxylate.
 21. Themethod according to claim 20, wherein applying comprises foaming thecomposition onto the hard surface from an unpressurized container. 22.An article of manufacture comprising: a container of a compositionincluding an alkoxylate and instructions on how to use the compositionas a polish.
 23. An article of manufacture according to claim 22,further comprising a wet wipe saturated with the composition.
 24. Anarticle of manufacture according to claim 22, wherein the compositioncomprises glycol.
 25. A method of polishing a hard surface, comprisingapplying a composition to the hard surface as a foam from anunpressurized container.